1. 讲授洁净室、高真空、薄膜沉积(溅射、热蒸镀、电子束蒸镀、等离子体化学气相沉积、涂膜)、薄膜图形化(光
刻、激光直写、丝网印刷、喷墨印刷)、刻蚀等基本制备工艺及透过率、反射率、吸收率、电阻率、膜厚、薄膜表面
形貌等基本表征技术。
2. 讲 授 各 种 光 电 器 件 如 有 机 发 光 二 极 管 ( OLED) 、 量 子 点 发 光 二 极 管 ( QLED) 、 交 流 薄 膜 电 致 发 光 器 件
(ACTFEL)、太阳能电池(PV)、薄膜晶体管(TFT)的工作原理、制造工艺以及测试表征技术。
3. 学生需参与到实验中,并亲自制作、表征各种功能薄膜及光电器件。通过实验,掌握薄膜和器件的制备工艺及表征技
术,加深理论知识的理解并锻炼学生动手能力、文献搜索、处理分析实验数据、口头演讲及科技写作的能力,为后续
从事科学与工程的研发工作打下坚实基础。
1. To introduce the clean room, high vacuum, thin film deposition (including sputtering, thermal evaporation, e-beam
evaporation, plasma enhanced chemical vapor deposition, spin coating), thin film patterning (including
photolithography, laser direct writing, screen printing, inkjet printing),etching and other fundamental fabrication
processes. Thin film characterization techniques including transmission, reflection, absorption, resistivity, thickness,
surface morphology are also covered.
2. To introduce the working mechanisms, the fabrication processes and the characterization techniques of various
optoelectronic devices including organic light-emitting diodes (OLED), quantum dot light-emitting diodes (QLED),
alternating current thin-film electroluminescent devices (ACTFEL), photovoltaic (solar) cells, thin-film transistors
(TFT) and etc.
3. Laboratory course requires hands-on work in fabricating and characterizing various thin films (including metal,
organic and ceramic) and devices (including OLED, QLED, ACTFEL, OPV and TFT). Process modules including
sputtering, thermal evaporation, e-beam evaporation, plasma enhanced chemical vapor deposition, spin coating,
photolithography, laser direct writing, screen printing, inkjet printing, etching and etc will be covered. Student will also
learn to characterize the fabricated thin films and devices.